In the field of thin-film research, there exists a novel method of film growth called Plasma Enhanced Chemical Vapor Deposition or PECVD. This technique utilizes the energetic electrons released from a plasma discharge to help catalyze chemical reactions in the deposition chamber that are essential to the film-growth process. Because plasma dynamics are not very well understood, much research goes into developing techniques to characterize a plasma's properties. In our research, we examined techniques used to measure the current versus voltage characteristic of an Argon plasma by use of a Langmuir Probe with the ultimate goal of determining the plasma's electron energy distribution.
Hansen, Andrew B.
"Langmuir Probe Measurements of an Argon Plasma,"
Macalester Journal of Physics and Astronomy: Vol. 2:
1, Article 5.
Available at: https://digitalcommons.macalester.edu/mjpa/vol2/iss1/5