Abstract
In the field of thin-film research, there exists a novel method of film growth called Plasma Enhanced Chemical Vapor Deposition or PECVD. This technique utilizes the energetic electrons released from a plasma discharge to help catalyze chemical reactions in the deposition chamber that are essential to the film-growth process. Because plasma dynamics are not very well understood, much research goes into developing techniques to characterize a plasma's properties. In our research, we examined techniques used to measure the current versus voltage characteristic of an Argon plasma by use of a Langmuir Probe with the ultimate goal of determining the plasma's electron energy distribution.
Streaming Media
Recommended Citation
Hansen, Andrew B.
(2014)
"Langmuir Probe Measurements of an Argon Plasma,"
Macalester Journal of Physics and Astronomy: Vol. 2:
Iss.
1, Article 5.
Available at:
https://digitalcommons.macalester.edu/mjpa/vol2/iss1/5