Abstract
Thin film solar cells offer a viable alternative to crystal silicon solar cells. They are expected to be cheaper to fabricate because they use material more efficiently, and are deposited in a process which can create larger area solar cells [1]. However, a high deposition rate is necessary for economic viability. A Monte Carlo simulation can model the molecular interactions in hot wire chemical vapor deposition and track the position and velocity distribution of molecular species in the gas [2]. Determining the flux on the substrate can help us to increase deposition rate by adjusting control parameters accordingly [3]. As a preliminary step, we compare thermalization properties of different intermolecular models to assess suitability for a gas phase scattering model.
Recommended Citation
Smith, AnnaLeigh
(2013)
"Monte Carlo Simulation for silicon on silane HWCVD for thin film solar cells,"
Macalester Journal of Physics and Astronomy: Vol. 1:
Iss.
1, Article 13.
Available at:
https://digitalcommons.macalester.edu/mjpa/vol1/iss1/13