Glancing angle deposition (GLAD) is a process in which thin films are deposited onto a substrate with obliquely incident vapor together with precisely controlled azimuthal substrate rotation. Ballistic shadowing effects due to the oblique incidence produce nanoscale structures, and a variety of feature shapes, including tilted columns, helices, and vertical columns can be achieved by varying the azimuthal rotation during the deposition process. Due to this control of morphology and the compatibility of the process with a wide variety of materials, GLAD films have found applications in a variety of fields including sensing, photonics, photovoltaics, and catalysis, where they are predominantly used as coatings with tunable optical, mechanical, and chemical properties. However, there has been little work regarding its use for the fabrication of electronic devices. GLAD films are interesting in this respect because it would enable nanoscale devices to be made without lithography. We propose a method for fabricating vertically-aligned, columnar Schottky diodes by GLAD. We then fabricate these devices using electron beam evaporation of chromium onto a silicon substrate, with chromium and aluminum contacts, and characterize these devices by SEM and I-V curve measurements.

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