Methane based gases are often used to produce thin films of biomaterials, such as diamond-like carbon, through Plasma Enhanced Chemical Vapor Deposition. The characterization of the H2 plasma will give a deeper understanding of the physical processes occurring. Understanding these processes could lead to the optimization of the production of these thin films in the future. In this paper, we examine the H2 plasma using a Langmuir probe to gain information on the electron temperature and density of the plasma discharge. We measured electron temperatures of 6eV. Our Langmuir probe data indicates the electron temperature remains constant as the power is increased and the additional energy is used to increase the plasma density at a rate proportional to the increase in power.
Stowell, Alexander A.
"Power and Langmuir Probe Measurements of H2 RF Plasma,"
Macalester Journal of Physics and Astronomy:
1, Article 9.
Available at: http://digitalcommons.macalester.edu/mjpa/vol4/iss1/9