Plasma-enhanced chemical vapor deposition is a widely used method for depositing thin films. In order to optimize the properties of the films, it is important to understand the plasma processes that occur during film growth. In this research we use optical emission spectroscopy in order to measure the spectral emission lines of a plasma produced with hydrogen gas. In conjunction with other measurements and modeling, these measurements can provide insight to the electron energy distribution of the plasma.
"Dissociative Excitation of H2 in an RF Plasma,"
Macalester Journal of Physics and Astronomy:
1, Article 2.
Available at: http://digitalcommons.macalester.edu/mjpa/vol4/iss1/2